Characterization of a commercial 65 nm CMOS technology for SLHC applications

摘要

The radiation characteristics with respect to Total Ionizing Dose (TID) and Single-Event Upsets (SEUs) of a 65 nm CMOS technology have been investigated. Single transistor structures of a variety of dimensions and several basic circuits were designed and fabricated. The circuits include a 64-kbit shift-register, a 56-kbit SRAM and a ring-oscillator. The test chips were irradiated up to 200 Mrad with an X-ray beam and the corresponding transistor threshold shifts and leakage currents were measured. Heavy-ion beam irradiation was performed to assess the SEU sensitivity of the digital parts. Overall, our results give the confidence that the chosen 65 nm CMOS technology can be used in future High Energy Physics (HEP) experiments even without Hardness-By-Design (HBD) solutions, provided that constant monitoring of the TID response is carried out during the full manufacturing phase of the circuits. © 2012 CERN.